Francesca Santoro received her Bachelor’s and Master’s degrees in Biomedical Engineering at the ‘Federico II’ University of Naples (Italy) with specialization in biomaterials. She received a PhD in 2014 in Electrical Engineering and Information Technology in a joint partnership between the RWTH Aachen and the Forschungszentrum Juelich (Germany). In October 2014, she joined Stanford University (USA) and received a research fellowship in 2016 by the Heart Rhythm Society. She joined IIT in July 2017 as Principal Investigator of the 'Tissue Electronics' lab. In 2018 she has been awarded the MIT Technology Review Under 35 Innovator ITALIA and EUROPE. She has been awarded an ERC Starting Grant in 2020. She is among the Inspiring Fifty Italy and Europe and is also the winner of the Falling Walls Science Breakthrough of the Year in Engineering and Technology in 2021. Since January 2022, she is Professor in Neuroelectronic Interfaces at RWTH Aachen and Forschungszentrum Juelich. She has been recently selected as a PI in the Interstellar Initiative by the New York Academy of Science and is the recipient of the prestigious Early Career Award by the German National Academy of Science Leopoldina.

Dr. Robert Chau is an Intel Senior Fellow and director of Intel Europe Research. He is responsible for establishing Intel’s semiconductor and packaging R&D infrastructures across Europe and expanding its R&D partnership with pan-European RTOs, academic research institutions, and local industries. Prior to taking on this role in June 2022, Dr. Chau was the general manager of Intel Components Research (CR) in the Technology Development group for 9 years, responsible for driving Intel’s internal R&D to enable Moore’s Law and beyond while managing a 300mm Fab (RP1) for research and pathfinding in Oregon, U.S.A. Under Dr. Chau’s leadership CR delivered many industry-first innovations such as PowerVia architecture, nanoribbon-FET, Foveros Omni interconnect for packaging, directed self-assembly patterning, and a 300mm GaN device and process technology. A 35-year Intel veteran, Dr. Chau holds more than 480 issued U.S. patents and was the recipient of the 2015 Intel Inventor of the Year Award on Intel’s FinFET technology. He received numerous semiconductor industry awards including the 2012 IEEE Jun-ichi Nishizawa Medal for his pioneer work on strained Si and high-k gate dielectrics. Dr. Chau is an IEEE Fellow and an elected member of the U.S. National Academy of Engineering.

Andreas Tünnermann - CV

Andreas Tünnermann was born in Ahnsen, Germany, on June 10th, 1963. He received the diploma and Ph.D. degree in physics from the University of Hannover. He was head of the department of laser development at the Laser Zentrum Hannover from 1992 to 1997. In the beginning of 1998 he joined the Friedrich-Schiller-University in Jena, Germany as a Professor and Director of the Institute of Applied Physics. In 2003 he became the Director of the Fraunhofer Institute of Applied Optics and Precision Engineering. Andreas Tünnermann enjoys an excellent reputation in the laser physics community, and is currently leading one of the most creative and productive photonic research groups in the world. The research interests of Andreas Tünnermann are focused on fundamental principles as well as sophisticated technical aspects and applications associated with the tailoring of light. 

In 1995, his group at the Laser Center Hannover demonstrated the extraction of 9.2 W power from a Neodymium-doped fibre laser with diffraction-limited beam quality. At that time, this record result changed the view of fiber lasers in the entire laser community: from laboratory curiosity to a laser scheme with extraordinary potential. Applying novel fiber designs and experimental strategies, Andreas Tünnermann and his team were able to scale the output power of these systems to the multi-kW range. This groundbreaking work yielded a variety of developments in laser technology and has found many advanced applications in basic science and industry. Major laser companies have adopted these concepts to develop advanced solid-state lasers. Based on advanced ytterbium-doped photonic crystal fibers, ultrafast laser systems have been developed in his laboratories, delivering world record average powers in the 1 µm wavelength region. This performance, in particular the significantly higher repetition rate compared to conventional femtosecond lasers, allows for unique approaches in several application fields. 

In this vein, Andreas Tünnermann is also known for his pioneering work in utilizing high power femtosecond lasers for material processing. In collaboration with his co-workers he demonstrated new prospects for ultra precise laser-based microstructure technology. Due to the rapid progress in this field, thought is currently geared to “real-world” industrial applications for these ultrafast lasers. 

Most recently, Andreas Tünnermann has again broken new ground in collaboration with Gerard Mourou and others: applying the technique of coherent combination, he was able to demonstrate pioneering experiments on the scalability of ultrafast fiber laser systems. Average powers of more than 10 kW in ultrafast laser operation are recorded. This outstanding work is proving that the technique of spatially separated amplification will be the basis for novel performance realms of ultrafast lasers in general and makes his team confident that high repetition rate multi-TW-class table-top fiber laser systems will be realized in the near future. These advanced lasers are already applied by his group to pump secondary sources emitting in the XUV spectral range to be used as coherent light sources for different short wavelength imaging techniques.

In recent years, Andreas Tünnermann's research groups have made a significant contribution to establishing applied quantum photonics as a focus and impetus in development, research and teaching in Jena. This work can be seen in the context of the second quantum revolution and can already look back on important scientific and technological contributions, especially in the areas of quantum communication and quantum imaging. The understanding of photonic technologies as an enabler for excellent basic research and as a driver for groundbreaking innovations is the foundation of this important strategic orientation. The latest research highlights are the development of space-suitable sources for entangled photons, the integration of quantum optical functionalities in waveguides and nano-optics, the development of novel imaging modalities with exotic light states, as well the realization of a platform for the integration of quantum materials with optical fibers. Most recently, based on these results his group demonstrated under the umbrella of the project QuNET a holistic quantum secure communication.

Phon: +49 3641 807-201   

E-mail: andreas.tuennermann@iof.fraunhofer.de

J. Alexander Liddle received his B.A. and D. Phil. degrees in Materials Science from the University of Oxford.
After his appointment in 1990 as a postdoctoral fellow at Bell Laboratories, he spent the next decade working on the research, development, and eventual commercialization of a novel electron-beam lithography technology. He is currently Chief of the Microsystems and Nanotechnology Division at NIST.
His division’s research runs the gamut from quantum nanophotonics to biology. His personal research focus is on nanofabrication and self-assembly for nanomanufacturing. He has published over 275 papers, in areas ranging from electron-beam lithography to DNA-controlled nanoparticle assembly and holds 19 US patents.
He is a fellow of the APS and the Washington Academy of Sciences, and a member of the AVS and MRS. He has served on numerous advisory and program evaluation committees, for NSF, DOE, DARPA, and the Semiconductor Research Corporation.

Uzodinma Okoroanyanwu, a research associate professor in the department of polymer science and engineering of University of Massachusetts at Amherst, conducts research aimed at developing functional materials, patterning methods, and devices used in electrochemical energy storage; chemical sensing; printed, flexible, flexible/hybrid and wearable electronics; and electromagnetic interference shielding. He is the founder of Enx Labs, a company that translates some of his research results into devices and instruments that help to improve the human condition and sustain the environment. He worked previously at Advanced Micro Devices, where he spent 12 years conducting research on advanced lithography and on organic polymer memories, and at GLOBALFOUNDRIES, where he spent 4 years conducting research on advanced lithography. He is the author of several books, including Chemistry and Lithography (SPIE Press & John-Wiley & Sons, 2010), Molecular Theory of Lithography (SPIE Press, 2015); Chemistry and Lithography, 2nd ed., Vol. 1: The Chemical History of Lithography (SPIE Press, 2020); and most recently, Chemistry and Lithography, 2nd ed., Vol. 2: Chemistry in Lithography (SPIE Press, 2023). A holder of 37 U.S patents, he was educated at The University of Texas at Austin, where he earned the following degrees: Ph.D. physical chemistry (1997), M.S. chemical engineering (1995), M.A. physical chemistry (1994), B.S. Chemistry and Chemical engineering (1991). He is a fellow of SPIE, the international society for optics and photonics, as well as an associate editor of the Journal of Micro/Nanopatterning, Materials, and Metrology.

Phone: 413 535 8165

E-Mail: uzokoro@umass.edu

Dr. Thomas Glinsner, Corporate Technology Director, EV Group

Dr. Thomas Glinsner is Corporate Technology Director for EV Group based at the company’s headquarters in St. Florian, Austria.  Dr. Glinsner joined EVG as product manager in 2000. He was appointed as Product Management Director in 2008 and Corporate Technology Director in 2014. In this role, Dr. Glinsner oversees product development for lithography, wafer bonding and nanoimprint lithography. Dr. Glinsner has authored and co-authored several technical papers and presentations on those topics.  

Dr. Glinsner graduated with a degree in Technical Chemistry from the Technical University in Vienna.  He received his Ph.D. degree from the University of Linz, Solid State and Semiconductor Physics Department, with a thesis on the fabrication of 3D photonic crystals by nanoimprint lithography. 

Phone: +43 7712 5311 5201

E-mail: t.glinsner@evgroup.com 

Kurt Ronse, Ph.D. has been working in the field of lithography at imec for over 30 years with responsibilities ranging from lithography researcher, lithography group manager, advanced patterning department director and advanced lithography program director.

Prior to joining imec, Ronse received a Ms. and Ph.D. degree in Electrical Engineering
from the University of Leuven (Belgium). 

In 2016, he has been elected Fellow of SPIE for achievements in microlithography and advanced patterning.  

Currently is leading the Advanced Patterning Program that is focusing primarily on the enablement of High NA EUV lithography ECO system and on the extendibility of EUVL to the next technology nodes for logic and DRAM. Also the feasibility of exploratory patterning techniques like Directed Self Assembly and Area Selective Deposition are being assessed.

Phone: +32 16 28 13 36

E-Mail: kurt.ronse@imec.be